Featured Semiconductor & Optical Quartzware
Precision-blown, continuous-drawn, and CNC-machined fused quartz tubes, crucibles, and customized laboratory vessels crafted from high-purity natural silica sand in Donghai and calibrated to ISO 9001 and European DIN standards.
Material Science: Vitreous Silica vs. Synthetic Fused Silica
An authoritative technical breakdown for mechanical designers, process vacuum engineers, and optical system architects across Vaduz and the broader St. Gallen–Alpenrheintal industrial hub.
Crystalline Transition & Cristobalite Kinetics
Electrically fused natural quartz (Type II) exhibits a low coefficient of thermal expansion ($\alpha \approx 5.5 \times 10^{-7} \text{ K}^{-1}$ between 20°C and 320°C). When exposed to continuous thermal loads exceeding 1150°C, the amorphous matrix nucleates into high-cristobalite. Our proprietary thermal annealing cycles and controlled $OH^-$ group reduction suppress premature surface devitrification, preventing micro-crack propagation under cyclic vacuum runs.
Spectral Transmission & UV/IR Doping
Standard clear fused quartz allows broad-band transmission from 260 nm in the near-ultraviolet through 2500 nm in the near-infrared spectrum. For ozone-inhibiting vacuum metallurgy and ultraviolet curing systems used in Liechtenstein electronics manufacturing, we introduce controlled titanium/cerium dopants ($TiO_2/CeO_2$) to filter out energetic 185 nm radiation while maintaining >90% transmission at 254 nm germicidal and crosslinking wavelengths.
Refractory Mechanical Tension & Viscosity
Our raw quartz tubes undergo continuous mechanical drawing and hydrogen-oxygen flame refining, delivering a tensile strength of 48 N/mm² and a compressive strength of 1100 N/mm². With an annealing point of 1210°C and a softening point of 1683°C, our custom quartz tubes provide zero gravitational sagging or wall collapse during physical vapor deposition (PVD) and chemical vapor deposition (CVD) cycles.
| Property Parameter | Test Standard / Metric Unit | Electric Melt Fused Quartz | Synthetic Fused Silica (Type III) |
|---|---|---|---|
| $SiO_2$ Chemical Purity | ICP-OES Spectrometry | ≥ 99.995% – 99.999% | ≥ 99.9999% |
| Density ($\rho$) | ISO 1183 ($g/cm^3$ at 20°C) | 2.20 ± 0.01 | 2.201 |
| Thermal Expansion (CTE) | $10^{-7} / K$ (20°C to 300°C) | 5.5 | 5.2 – 5.4 |
| Softening Point (Viscosity $10^{7.6}$ dPa·s) | DIN ISO 7884-3 (°C) | 1683°C | 1600°C – 1650°C |
| Annealing Point (Viscosity $10^{13.0}$ dPa·s) | DIN ISO 7884-4 (°C) | 1210°C | 1180°C |
| Dielectric Strength ($E_d$) | kV/mm (at 20°C, 1 MHz) | 25 – 40 | 30 – 45 |
| Refractive Index ($n_d$) | $\lambda = 589.3 \text{ nm}$ (Sodium D line) | 1.4585 | 1.4584 |
| Hydroxyl ($OH^-$) Content | FTIR Infrared Absorption (ppm) | < 5 ppm (Low-OH) / < 30 ppm (Std) | > 800 – 1200 ppm |